Search Results - xianyun+ma

1 Results Sort By:
Nondestructive Defect Delineation in SiC Wafers Using Optical Stress Technique
Reference #: 00367 The University of South Carolina is offering licensing opportunities for this technology Invention Description: This invention is cost-effective, rapid, and nondestructive characterization technique, which can be used for fast and routine SiC wafer-scale evaluation of structural and crystallographic defects. The technique employed...
Published: 9/2/2022   |   Inventor(s): Tangali Sudarshan, Xianyun Ma, Toshiro Kubota, Parag Talekar, Matthew Parker
Keywords(s):  
Category(s): Engineering and Physical Sciences
© 2024. All Rights Reserved. Powered by Inteum